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Polishing Cloths
A wide range of woven, non-woven and napped (flocked) polishing
cloths are available for fine grinding or coarse, intermediate,
and final polishing of all materials. They are available either with adhesive backing for standard platens or with magnetic system backing for magnetic platens.
Woven: Woven cloths feature low compression, applying effective pressure to the loose abrasive particles for maximum material removal and flatness/planarity. The cross-weave pattern is ideal for fine grinding or coarse and intermediate polishing.
Non-woven: Non-woven cloths also feature low compression with softer surfaces, better suited for intermediate and final polishing of soft non-ferrous metals, ferrous alloys and polymers/plastics.
Napped (flocked): Made from various length fibers and fabric stiffness, they are used for final polishing as the flock pattern "brushes" the sample to clean and remove intermediate and coarse polishing scratches. Stiff/rigid fibers are commonly used for polishing soft metals and materials.
For comparison, all SEM photographs in this section are at
50X magnification.
| PLAN-Cloth |
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Very hard, resin-coated, durable, coarse woven polyester for use with diamond (30-6 micron). Produces high material removal rate, and excellent flatness on a variety of materials.
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| Plan-B |
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Rigid, densely woven pad used with diamond (15-3 micron) and any lubricant. Maintains superior edge retention and flatness, providing aggressive material removal for coarse to intermediate polishing of metals, ceramics and refractory materials.
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| Gold Label |
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Dense, uniquely woven nylon, extremely durable for use with diamond (15-3 micron). Produces excellent flatness and provides a very high material removal rate on a wide variety of materials. Exceptional for intermediate polishing of refractory metals, glass, ceramics, coatings and composites.
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| Nylon |
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Woven nylon for use with diamond (15-3 micron). Provides good flatness and edge retention for most materials.
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| TECH-Cloth |
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Dense, woven synthetic silk for use with diamond (9-1 micron). Produces very good edge retention and provides excellent finish and flatness. Especially good for coatings and samples composed of materials with varying hardness.
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| White Label |
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Woven silk with plastic barrier used with diamond (6-1 micron) and an extender. Provides excellent flatness and edge retention prior to final polishing on a wide variety of materials
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| Diamat |
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Woven wool with plastic barrier used with diamond (6-0.25 micron) and any lubricant. Provides excellent durability, edge retention and surface finish on most materials. Commonly used as a final polish with 1 or 3 micron diamond.
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| Kempad |
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Non-woven, very low nap textile for use with diamond
(9-1 micron). Provides good removal and flatness on a wide variety of materials.
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| Pan-B |
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Dense, non-woven planarized textile for use with diamond (6-0.25 micron). Provides good removal rates and edge retention on a wide variety of materials.
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| Chem-Pol |
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Dense, non-woven, low nap porous polyurethane for chemical/
mechanical polishing using colloidal suspensions or alumina. This long-lasting cloth provides an excellent final polish for a wide variety of materials.
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| Final A |
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High density, non-woven, low nap porous polyurethane pad for use with diamond (1-0.05 micron), colloidal suspensions or alumina. Excellent for final polishing a wide variety of
materials. Especially effective in eliminating smearing and pullout when preparing soft metals such as copper and aluminum, porous structures/materials, or when preparing materials for SEM or TEM evaluation.
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| Spec-Cloth |
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Soft, medium nap, synthetic rayon flock for use with
diamond (1-0.25 micron) or alumina. For general polishing of a wide range of materials.
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| Vel-Cloth |
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Soft, medium-low nap synthetic flock for use with
diamond (1-0.25 micron) or alumina. Provides very good flatness on a wide variety of materials.
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| Final B |
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Fine rayon bound to a cotton canvas backing used with
diamond (3-0.25 micron) and either RedLube or
GreenLube extenders. Provides an excellent finish,
especially when preparing ferrous materials.
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| Red Final C |
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Dense, low-napped silk used with colloidal silica (0.06-
0.02 micron) to provide an excellent final polish on a wide
variety of materials. Especially effective when preparing
materials for SEM or TEM evaluation.
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| Final P |
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Low napped, stiff flocked cloth used with diamond (3-0.1 micron) and any lubricant, or with colloidal silica and/or alumina. Ideal for final polishing soft metals such as copper and aluminum.
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| Final-POL |
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Medium-long napped synthetic flock used with alumina or diamond (3-0.25 micron) and either RedLube™ or GreenLube™ lubricant. Durable and long-lasting, it is excellent for almost any material.
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| Silk |
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Natural woven silk used with diamond (6-1 micron). Provides excellent flatness and edge retention on most materials.
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| Stainless Steel Mesh |
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Fine stainless steel mesh on an aluminum foil
polyethylene backing. Use with diamond (45-1 micron) and
any extender for regular or vibratory polishing of ceramic
composites and other hard materials.
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| Billiard |
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A woven cloth, that is durable and good for polishing most
metals using diamond or alumina polishing abrasives for
intermediate polishing (15-3 micron).
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| Glenco |
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Stiff-napped, synthetic rayon used with diamond (3-1
micron) or alumina and either RedLube or GreenLube
extenders. Excellent intermediate or final polish on soft
non-ferrous metals.
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| Imperial |
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Low-napped, synthetic rayon flock with film backing used
with diamond (9-0.25 micron), colloidal silica (0.06-0.02
micron) or alumina and either RedLube or GreenLube
extenders. Very good all purpose final polishing cloth.
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